Patents
This invention relates to process for depositing hard diamond like carbon coating on silicon carbide grains by thermal plasma. The diamond like carbon coated silicon carbide powder finds wide application in grinding, polishing and lapping. The product is produced within a short time of the order of 15-30 minutes. The process is a low cost by using thermal plasma in the form of arc which does not involve high capital investment. . The arc plasma reactor using graphite electrode is easy to fabricate, cheap and simple to operate unlike plasma CVD and other processes.