Research

Materials Science

Title :

Low cost gram scale high quality and defect free graphene by scalable Plasma spraying

Area of research :

Materials Science

Focus area :

Nano Science, Engineering

Principal Investigator :

Dr. Anup Kumar Keshri, Indian Institute Of Technology (IIT) Patna, Bihar (801103), Dr. Shailesh Mani Pandey, National Institute Of Technology, Patna, Bihar (800005)

Timeline Start Year :

2024

Timeline End Year :

2027

Contact info :

Details

Executive Summary :

Graphene, a two-dimensional nano-material with a single layer of carbon atoms, is highly sought after for its applications in electronics, sensors, fuel, and solar cells. However, producing high-quality graphene requires large-scale, high-efficiency production. Despite advancements in synthesis, methods like chemical vapour deposition and epitaxial growth have been insufficient for large-scale production. A novel protocol, plasma spraying of exfoliation graphite to graphene, is proposed to produce high-quality graphene with almost no defects without the use of intercalates chemicals or solvents. This technique aims to produce solvent/chemical-free, high-quality, defect-free graphene in bulk quantity and at low cost, bridging the gap between laboratory protocols and commercial applications. The protocol involves obtaining high-quality synthetic graphite powder, subjecting it to preliminary characterizations, and selecting plasma process parameters.

The study uses a DC plasma spraying system to exfoliate graphite into high-quality graphene using argon and hydrogen as primary and secondary gases. The process involves thermal shock, exfoliation, and collection of exfoliated graphite. The XRD analysis confirms the exfoliation of graphene nano-sheets.<./p>

Total Budget (INR):

1,22,63,400

Organizations involved