Patents

FR2766314: Vortex diodes as reactors and effluent treatment devices

The invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of wastewater treatment. The invention discloses vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduce Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of wastewater effectively in effluent treatments.

Filing Date: 22-04-2014

Issue Date: 03-04-2019

Applicant: CSIR-National Chemical Laboratory (CSIR-NCL), Pune

Patent No: FR2766314

Application No: 12795083

Inventor(s): Vivek Vinayak Ranade; Amol Arvind Kulkarni; Vinay Manoharrao Bhandari

Country: France

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